刻蚀原理: 等离子体刻蚀
产地类别: 进口
刻蚀原理: 干法
均匀性: 1%
宽深比: 1-2
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RIE, PECVD, and Plasma Etch systems are all
built on a single, easy to use platform, ensuring
low maintenance, training, and operational costs
as your technology requirements expand.
• Reconfigure chamber components, materials,
and feed gases to provide more process
capabilities and technologies over time as you
requirements change.
• Experienced staff provides an exceptional
technical resource for new process development
activities to ensure your new processes are
developed ahead of schedule and below cost.
• Small footprint, bench top design requires
minimal clean room space.
• Simple process controller ensures fast learning
curve for new users, while providing exceptional
process control and capabilities.
• Our company’s customer service, engineering,
and support services ensure your success,
including unlimited phone/email support, full
customer training and complete factory testing
and qualification prior to system shipment.
• Combine Plasma Etch and PECVD processes on
a single system to keep capital costs low.
产品货期: 200天
整机质保期: 1年
培训服务: 安装调试现场免费培训
德国美克等离子体刻蚀MPS-150的工作原理介绍
等离子体刻蚀MPS-150的使用方法?
德国美克MPS-150多少钱一台?
等离子体刻蚀MPS-150可以检测什么?
等离子体刻蚀MPS-150使用的注意事项?
德国美克MPS-150的说明书有吗?
德国美克等离子体刻蚀MPS-150的操作规程有吗?
德国美克等离子体刻蚀MPS-150报价含票含运吗?
德国美克MPS-150有现货吗?
最多添加5台