ELPHY图形发生器

Nanopatterning made simple

ELPHY stands for the easiest and most economical access to professional nanolithography and nanofabrication. It provides all you need to get off to an efficient start.

ELPHY upgrade kits, also known as “lithography attachments,” enable virtually any SEM or FIB to be converted into a nanolithography or nanofabrication station in order to fully exploit its nanopatterning potential –– without sacrificing any of its original functionality! With features such as

• professional GDSII file handling

• patterning on image functionality

• FLEXposure directional scanning modes

• remote access to relevant SEM or FIB parameters

• beam blank and stage control

• position list for sophisticated batch job automation (including scripting)

• advanced lithography functionality for e.g. 3D processes or proximity effect correction

• sophisticated FIB-specific nanopatterning capabilities, and

• unique hardware concept providing the equivalent of more than 16-bit main DACs only for sub-nm pattern placement control,

ELPHY attachments significantly enhance an SEM or FIB-SEM with respect to the degree of automation, bandwidth and complexity of potential nanofabrication applications when adapted to these tools.

ELPHY features the same NANOSUITE software platform as the Raith turnkey systems, thus benefiting from all comprehensive software modules and functionalities that accompany a dedicated EBL instrument. Adapted to an SEM, a FIB, a FIB-SEM, or a HIM, ELPHY is capable of handling a whole range of nanopatterning tasks, from simple single write field exposures to complex and highly automated multi-level and multi-field patterning sequences or metrology jobs. More than 100 person-years of software development have gone into ELPHY software. Ask for an online software demonstration and see for yourself why it is the most widely used solution worldwide!