IM4000型离子研磨系统

Cross section and sample surface polishing ability combined in a single unit

The new Hitachi IM4000 Ar ion milling system makes two milling configurations available in a single instrument.
While previously two separate systems were needed to perform both, cross section cutting (E-3500) and wide-area sample surface fine polishing (IM3000), Hitachi's new IM4000 now allows to run both applications within the same machine.

Furthermore, the new Ar ion gun design of the IM4000 allows to reduce cross section processing times by as much as 66% compared to the previous E-3500 as the maximum milling rate has been increased to now 300µm/h for Si.

Also in the IM4000 the sample stage unit can be removed as a whole for convenient specimen setting and cross section cutting edge fine positioning using as external high-resolution optical microscope.


 

Cross Section Milling
 

Conventional mechanical polishing or cutting techniques on soft and composite materials apply significant lateral sheer forces to the sample and often result in cross section surface artefacts such as scratches, smearing, wash-out of softer materials, delamination and other damage.
In contrast, ion beam sputtering is a stress-free physical process whereby atoms are ejected from a  target material due to bombardment of the target by energetic particles.
Mirror-surface quality cross sections are formed by placing an ion beam resistant mask in such way onto a sample surface that one half of the vertically incident ion beam is blocked by the mask. The other half of the ion beam gradually removes the sample material protruding from the mask, so that a straight cross sectional plain is formed below the edge of the protective mask.

The range of materials and samples applicable to ion cross section milling is not limited to hard matter; even "soft" samples such as paper, polymers, and even powders allow high-quality sectioning in the IM4000.