溅射离子枪主要用途:
溅射清洗/表面科学中样品表面处理, MBE and HV 溅射过程
离子辅助沉积
离子束溅射镀膜
反应离子刻蚀
技术指标:
| 离子能量 | 25eV - 5keV |
| 总的离子束电流 | 1mA (at 5kV with Argon) High Current Version: up to 4mA (at 5kV with Argon) |
| 电流密度 | 120μA/cm2 at 100mm working distance |
| 离子束发散角 | Ion energy dependant (typically 15°) |
| 工作距离 | 100 mm (typically) |
| 等离子体杯 | Alumina (superior than other dielectric materials due to highest yield of secondary electrons) |
| 气体进气口径 | CF-16 (1.33“OD) |
| 气体流速 | 1 - 5 sccm (1,5 sccm typical, gas dependant) |
| 工作真空度 | 10-6mbar - 10-3mbar (1x10-5mbar typical in chamber with 300l/s pimp). Low 10-6 mbar range possible - beam current then 140μA max. |
| 激发模式 | 微波放电等离子体 (无灯丝) |
| 安装口径 | CF-35 (2.75“OD) |
| 枪直径 | 34mm (真空端) |
| 泄露阀 | 需要气体质量流量计 |
